Manufacture of high precision electronic components with ultra-h

Details Manufacture of high precision electronic components with ultra-h Manufacture of high precision electronic components with ultra-h

1991-03-19

1993-09-07

Chaudhuri, Olik

Metal working

Barrier layer or semiconductor device making

1341022, 134902, B08B 308, H01L 21306

Patent

active

052424685

ABSTRACT:
Semiconductor wafers and other electronic parts which similarly require ultra-high purity manufacturing environments are treated with ultra-high purity liquid cleaning and etching agents prepared at the site of use from gaseous raw materials which have been purified to a level compatible with semiconductor manufacturing standards, combined when appropriate with ultra-pure water.

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J. E. Martyak et al., "Reviewing Analytical Techniques for the Characterization of Deionized Water," Microcontamination, pp. 19-26, Feb. 1991.

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