Manufacture of field emission emitter and field emission type de

Details Manufacture of field emission emitter and field emission type de Manufacture of field emission emitter and field emission type de

1996-07-23

1998-02-24

Bradley, P. Austin

Electric lamp or space discharge component or device manufacturi

Process

Electrode making

445 24, H01J 130, H01J 902

Patent

active

057206414

ABSTRACT:
A recess having a vertical side wall is formed in a silicon substrate, and a first sacrificial film is deposited on the surface of the silicon substrate and etched to form a side spacer on the side wall of the recess. A second sacrificial film is deposited over the substrate surface and oxidized to form an oxide film on the surface of the second sacrificial film, this oxide film serving as a cathode mold die. A cathode conductive film is deposited and selectively etched to form a field emission cathode.

REFERENCES:
patent: 5100355 (1992-03-01), Marcus et al.
patent: 5141459 (1992-08-01), Zimmerman
patent: 5203731 (1993-04-01), Zimmerman
patent: 5334908 (1994-08-01), Zimmerman
patent: 5599749 (1997-02-01), Hattori
patent: 5603649 (1997-02-01), Zimmerman
patent: 5643032 (1997-07-01), Cheng et al.

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