Manufacture of a silicon waveguide structure

Etching a substrate: processes – Forming or treating optical article

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216 2, 438689, B44C 122, H01L 2100

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active

060632992

ABSTRACT:
A process for making a silicon rib wavegide structure is described comporising the following steps:

REFERENCES:
patent: 4787691 (1988-11-01), Lorenzo et al.
patent: 4929302 (1990-05-01), Valette
patent: 5143577 (1992-09-01), Haas et al.
Margail, J. et al., entitled "Reduced Defect Density in Silicon-on-Insulator Structures Formed by Oxygen Implantation in Two Steps", Appl. Phys. Lett., vol. 54, No. 56, pp. 526-528. Feb. 6, 1989.
Schmidtchen, J., et al., entitled "Low Loss Singlemode Optical Waveguides with Large Cross-Section in Silicon-On-Insulator", Electronics Letters, vol. 27, No. 16, pp. 1486-1488, Aug. 1, 1991.

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