Measuring and testing – Fluid pressure gauge – With pressure and/or temperature compensation
Patent
1987-04-22
1988-10-25
Noland, Tom
Measuring and testing
Fluid pressure gauge
With pressure and/or temperature compensation
73747, G01L 1904
Patent
active
047794640
ABSTRACT:
A dual cistern manometer having a vertically extending manometer assembly is designed to reduce the temperature gradient along a vertical axis. The assembly is housed in a cylindrical chamber that is itself surrounded by an outer cylindrical enclosure. The enclosure is coaxial with and spaced from the chamber cylinder to form a first annular return air duct. A first annular wall extends across the top of the cylindrical chamber and is supported by the cylindrical enclosure. A second, annular wall secured to the top of the chamber cooperates with the first wall to define a second, annular return air duct having a continuously curved shape for directing upwardly flowing air from the measurement chamber outwardly and downwardly into the first annular return air duct. The lower end of the first return air duct is curved and joins a plenum that supplies air to the bottom of the measurement chamber for upwardly flow over the manometer assembly to reduce the temperature gradient along the dual cistern structure of the manometer. The manometer assembly includes spaced, vertical columns that guide a horizontal bridge that carries a movable cistern of a dual cistern type manometer assembly.
REFERENCES:
patent: 3225599 (1965-12-01), Schwien
patent: 4155248 (1979-05-01), Wagner et al.
patent: 4563892 (1986-01-01), D'Aoust
Schwien et al., "Dual Cistern Manometry", Measurements & Control, Oct. 1980.
Martine, Jr. Chester E.
Noland Tom
Raevis Robert R.
Schwien & Son, Inc.
LandOfFree
Manometer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Manometer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manometer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2262015