Manipulator assembly in ion implanter

Details Manipulator assembly in ion implanter Manipulator assembly in ion implanter

2007-09-18

2007-09-18

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S3960ML, C250S492200, C250S398000, C250S492300

Reexamination Certificate

active

11025595

ABSTRACT:
A manipulator assembly in an ion implanter comprises a ground electrode, a first suppression electrode located on a first side of the ground electrode facing an ion source device for producing ion beams, a second suppression electrode which is located on a second side of the ground electrode opposite to the first side, connection legs which electrically connect and mechanically support the first and second suppression electrodes; and an insulator which is located between the ground electrode and the second suppression electrode to insulate the ground electrode from the first and second suppression electrodes.

REFERENCES:
patent: 5399871 (1995-03-01), Ito et al.
patent: 5932882 (1999-08-01), England et al.
patent: 5959396 (1999-09-01), Moreshead et al.
patent: 6060715 (2000-05-01), England et al.
patent: 6291827 (2001-09-01), Tsai et al.
patent: 6501078 (2002-12-01), Ryding et al.
patent: 6534775 (2003-03-01), Harrington et al.

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