Manipulation device for precision adjustments including a double

Optics: measuring and testing – Range or remote distance finding – With photodetection

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356399, G02B 2132

Patent

active

041263766

ABSTRACT:
The invention relates to a manipulation device for precision adjustment of plane pattern bearing substrates being provided with two adjustment marks which are at different distances relative to a reference mark, which is, for example, a graduation plate. Such a substrate can be, for example, an intermediate negative or the like which is required in the course of a photolithographic mask production of integrated circuits. The manipulation device is constructed in such a manner that the pattern bearing substrate is substantially aligned relative to a reference mark by two orthogonal displacements and one rotation. This is accomplished by three displacement members which act upon a slide. Said slide, upon which the pattern bearing substrate is disposed, permits displacements parallel to the plane of the latter. Said displacement members are so arranged that the vectors of the orthogonal displacement actions pass one of the two adjustment marks.
Therefore, one of the two displacement members is, according to the distance between the adjustment marks on the pattern bearing substrate, seated for definite displacement steps, at right angles to the displacement direction of the substrate.

REFERENCES:
patent: 3288045 (1966-11-01), Harding
patent: 3600811 (1971-08-01), Weyrauch
patent: 3628717 (1971-12-01), Lynch et al.
patent: 3720849 (1973-03-01), Bardolz
patent: 3870416 (1975-03-01), Brady et al.

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