Manganese alloy sputtering target and method for producing...

Metal treatment – Stock – Noble metal base

Reexamination Certificate

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C148S424000, C148S426000, C420S428000, C420S433000, C420S434000, C420S459000, C420S461000, C420S462000, C420S463000, C420S466000, C420S507000

Reexamination Certificate

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10474451

ABSTRACT:
A manganese alloy sputtering target characterized in that oxygen is 1000 ppm or less, sulfur is 200 ppm or less and a forged texture is provided, and a method for producing a forged manganese alloy target stably by eliminating the drawbacks of manganese alloy that it is susceptible to cracking and has a low rupture strength. A manganese alloy sputtering target which can form a thin film exhibiting high characteristics and high corrosion resistance while suppressing generation of nodules or particles is thereby obtained.

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