Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2006-03-07
2006-03-07
Picard, Leo (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C716S030000
Reexamination Certificate
active
07010380
ABSTRACT:
A system which manages a plurality of semiconductor exposure apparatuses holds TIS information representing the characteristics of the respective semiconductor exposure apparatuses. In a semiconductor exposure apparatus, a parameter value is optimized on the basis of AGA measurement results obtained using a set parameter value and another parameter value and AGA measurement estimation results obtained by virtually changing the parameter value. Whether to reflect the optimized parameter value in another exposure device is decided on the basis of the TIS information. If it is decided to reflect the optimized parameter value, the parameter value of another semiconductor exposure apparatus is optimized by the optimized parameter value. In this manner, the optimization result of a parameter value by a given exposure device can be properly reflected in another exposure device, realizing efficient parameter value setting.
REFERENCES:
patent: 4634240 (1987-01-01), Suzuki et al.
patent: 4635373 (1987-01-01), Miyazaki et al.
patent: 4645924 (1987-02-01), Suzuki et al.
patent: 4669883 (1987-06-01), Ina et al.
patent: 4669885 (1987-06-01), Ina
patent: 4834540 (1989-05-01), Totsuka et al.
patent: 4861162 (1989-08-01), Ina
patent: 4886974 (1989-12-01), Ina
patent: 4901109 (1990-02-01), Mitome et al.
patent: 4958160 (1990-09-01), Ito et al.
patent: 5243377 (1993-09-01), Umatate et al.
patent: 5586059 (1996-12-01), Oshelski et al.
patent: 5659384 (1997-08-01), Ina
patent: 5682239 (1997-10-01), Matsumoto et al.
patent: 5742406 (1998-04-01), Suzuki
patent: 5847974 (1998-12-01), Mori et al.
patent: 5937069 (1999-08-01), Nagai et al.
patent: 6124922 (2000-09-01), Sentoku
patent: 6151120 (2000-11-01), Matsumoto et al.
patent: 6154281 (2000-11-01), Sentoku et al.
patent: 6198181 (2001-03-01), Ali et al.
patent: 6223133 (2001-04-01), Brown
patent: 6275988 (2001-08-01), Nagashima et al.
patent: 6311096 (2001-10-01), Saxena et al.
patent: 6344892 (2002-02-01), Sugita et al.
patent: 6470230 (2002-10-01), Toprac et al.
patent: 6493065 (2002-12-01), Ina et al.
patent: 6559924 (2003-05-01), Ina et al.
patent: 6563573 (2003-05-01), Morohoshi et al.
patent: 6607926 (2003-08-01), Toprac et al.
patent: 6785583 (2004-08-01), Oishi et al.
patent: 2001/0043326 (2001-11-01), Ina et al.
patent: 2002/0046140 (2002-04-01), Kano et al.
patent: 2002/0051125 (2002-05-01), Suzuki
patent: 2002/0100013 (2002-07-01), Miwa et al.
patent: 2002/0111038 (2002-08-01), Matsumoto et al.
patent: 2002/0175300 (2002-11-01), Suzuki et al.
patent: 2002/0176096 (2002-11-01), Sentoku et al.
patent: 2002/0180983 (2002-12-01), Ina et al.
patent: 2003/0012373 (2003-01-01), Ogura et al.
patent: 2003/0022396 (2003-01-01), Ogawa
patent: 2003/0071980 (2003-04-01), Ina et al.
patent: 2003/0119216 (2003-06-01), Weed
patent: 2003/0121022 (2003-06-01), Yoshitake et al.
patent: 2003/0204282 (2003-10-01), Oishi et al.
patent: 1 248 154 (2002-10-01), None
patent: 2000-306815 (2000-11-01), None
patent: 200306815 (2000-11-01), None
patent: 2003-0032871 (2003-04-01), None
Translation of JP 2000-306815.
European Search Report dated Jul. 4, 2005, issued in corresponding European patent application No. EP 03 00 9611, forwarded in a Communication dated Jul. 22, 2005.
Lee, C., et al., “Reducing CD Variation via Statistically Matching Steppers,”SPIE, vol. 1261,Integrated Circuit Metrology, Inspection and Process Control IV, (Mar. 1990). pp. 63-70.
van den Brink, M.A., et al. “Matching Management of Multiple Wafer Steppers Using a Stable Standard and a Matching Simulator,”SPIE, vol. 1087,Integrated Circuit Metrology, Inspection, and Process Contol III(Feb. 1989). pp. 218-232.
Korean Office Action dated May 23, 2005, issued in a corresponding Korean patent application, No. 10-2003-0027396, with English translation.
Ina Hideki
Matsumoto Takahiro
Oishi Satoru
Sentoku Koichi
Suzuki Takehiko
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Jarrett Ryan A.
Picard Leo
LandOfFree
Management system, management method and apparatus, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Management system, management method and apparatus, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Management system, management method and apparatus, and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3550956