Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2006-06-27
2006-06-27
Picard, Leo (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S029000, C700S051000, C700S108000, C703S002000, C716S030000, C250S548000
Reexamination Certificate
active
07069104
ABSTRACT:
A management system including an acquisition device for acquiring actual processing results obtained by operating an industrial device with a set parameter value and another parameter value, and an estimated processing result, an inspection device for inspecting the processing result obtained with the set parameter value, and acquiring and accumulating an inspection result value, a change device for changing the set parameter value on the basis of the processing results acquired by the acquisition device and the inspection result value obtained by the inspection device, an evaluation device for evaluating a variation state of the processing results on the basis of an inspection result value accumulated by the inspection device, and a decision device for deciding, on the basis of an evaluation result by the evaluation device, a frequency at which the acquisition device is executed.
REFERENCES:
patent: 4634240 (1987-01-01), Suzuki et al.
patent: 4635373 (1987-01-01), Miyazaki et al.
patent: 4645924 (1987-02-01), Suzuki et al.
patent: 4669883 (1987-06-01), Ina et al.
patent: 4669885 (1987-06-01), Ina
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4834540 (1989-05-01), Totsuka et al.
patent: 4861162 (1989-08-01), Ina
patent: 4886974 (1989-12-01), Ina
patent: 4901109 (1990-02-01), Mitome et al.
patent: 4958160 (1990-09-01), Ito et al.
patent: 5243377 (1993-09-01), Umatate et al.
patent: 5586059 (1996-12-01), Oshelski et al.
patent: 5659384 (1997-08-01), Ina
patent: 5682239 (1997-10-01), Matsumoto et al.
patent: 5742406 (1998-04-01), Suzuki
patent: 5805866 (1998-09-01), Magome et al.
patent: 5847974 (1998-12-01), Mori et al.
patent: 5937069 (1999-08-01), Nagai et al.
patent: 6124922 (2000-09-01), Sentoku
patent: 6151120 (2000-11-01), Matsumoto et al.
patent: 6154281 (2000-11-01), Sentoku et al.
patent: 6198181 (2001-03-01), Ali et al.
patent: 6223133 (2001-04-01), Brown
patent: 6275988 (2001-08-01), Nagashima et al.
patent: 6311096 (2001-10-01), Saxena et al.
patent: 6333786 (2001-12-01), Uzawa et al.
patent: 6344892 (2002-02-01), Sugita et al.
patent: 6470230 (2002-10-01), Toprac et al.
patent: 6493065 (2002-12-01), Ina et al.
patent: 6559924 (2003-05-01), Ina et al.
patent: 6563573 (2003-05-01), Morohoshi et al.
patent: 6607926 (2003-08-01), Toprac et al.
patent: 6785583 (2004-08-01), Oishi et al.
patent: 2001/0020946 (2001-09-01), Kawakami et al.
patent: 2001/0043326 (2001-11-01), Ina et al.
patent: 2002/0014601 (2002-02-01), Yoshida
patent: 2002/0046140 (2002-04-01), Kano et al.
patent: 2002/0051125 (2002-05-01), Suzuki
patent: 2002/0100013 (2002-07-01), Miwa et al.
patent: 2002/0111038 (2002-08-01), Matsumoto et al.
patent: 2002/0175300 (2002-11-01), Suzuki et al.
patent: 2002/0176096 (2002-11-01), Sentoku et al.
patent: 2002/0180983 (2002-12-01), Ina et al.
patent: 2003/0012373 (2003-01-01), Ogura et al.
patent: 2003/0022396 (2003-01-01), Ogawa
patent: 2003/0071980 (2003-04-01), Ina et al.
patent: 2003/0119216 (2003-06-01), Weed
patent: 2003/0121022 (2003-06-01), Yoshitake et al.
patent: 2003/0204282 (2003-10-01), Oishi et al.
patent: 1 248 154 (2002-10-01), None
patent: 2000-306815 (2000-11-01), None
patent: 2003-0032871 (2003-04-01), None
European Search Report dated Jul. 4, 2005, issued in corresponding European patent application No. EP 03 00 9611, forwarded in a Communication dated Jul. 22, 2005.
Lee, C., et al., “Reducing CD Variation via Statistically Matching Steppers,”SPIE, vol. 261,Integrated Circuit Metrology, Inspection and Process Control IV, (Mar. 1990). pp. 63-70.
van den Brink, M.A., et al. “Matching Management of Multiple Wafer Steppers Using a Stable Standard and a Matching Simulator,”SPIE, vol. 1087,Integrated Circuit Metrology, Inspection, and Process Control III(Feb. 1989). pp. 218-232.
Lee, C., et al., “Reducing CD Variation via Statistically Matching Steppers,”SPIE, vol. 1261,Integrated Circuit Metrology, Inspection and Process Control IV, (Mar. 1990). pp. 63-70.
van den Brink, M.A., et al. “Matching Management of Multiple Wafer Steppers Using a Stable Standard and a Matching Simulator,”SPIE, vol. 1087,Integrated Circuit Metrology, Inspection, and Process Control III(Feb. 1989). pp. 218-232.
Korean Office Action dated May 23, 2005, issued in a corresponding Korean patent application, No. 10-2003-0027396, with English translation.
Ina Hideki
Matsumoto Takahiro
Oishi Satoru
Sentoku Koichi
Suzuki Takehiko
Lee Douglas S.
Picard Leo
LandOfFree
Management system, management apparatus, management method,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Management system, management apparatus, management method,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Management system, management apparatus, management method,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3703010