Management of waste solution containing photoresist materials

Details Management of waste solution containing photoresist materials Management of waste solution containing photoresist materials

1991-03-01

1992-05-12

Jones, W. Gary

Liquid purification or separation

Processes

Liquid/liquid solvent or colloidal extraction or diffusing...

210653, 210654, 21050038, 21050037, B01D 6100

Patent

active

051124912

ABSTRACT:
The present invention relates to management of photoresist-resin-containing waste solution by feeding non-aged waste to a membrane device having a Desal-5 piperazine-based membrane modified to increase MWCO for uncharged organic molecules sufficiently so that, on a weight basis, alkalizing agent passage is greater than 90%, photoresist material rejection is essentially complete, color rejection is greater than 95% and COD rejection is greater than 80% to produce a clean permeate solution that can be recycled and a concentrate to be removed.

REFERENCES:
patent: 4294704 (1981-10-01), Daniel et al.
patent: 4786417 (1988-11-01), Miki et al.
patent: 4938872 (1990-07-01), Strantz, Jr. et al.
The Desal 5 Membrane, Desalination Systems Inc., Feb. 1989.

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