Management of photoresist materials containing waste solution

Details Management of photoresist materials containing waste solution Management of photoresist materials containing waste solution

1987-07-22

1988-11-22

Spear, Frank

Liquid purification or separation

Processes

Liquid/liquid solvent or colloidal extraction or diffusing...

210651, 2101952, B01D 1300

Patent

active

047864176

ABSTRACT:
There is provided management of a photoresist resin containing waste solution discharged from printed circuit boards manufacturing process, printing industries, a semiconductor manufacturing industry and the other industries using photoresist materials. The photoresist resin containing waste solution is subjected to an ultrafiltration of the specified characteristics so as to separate definitely organic waste materials having relatively higher molecular weight which should be disposed from an effective and useful components contained in a permeate to be recycled or recovered resulting very efficient processing. Further, the inventive process provides useful management of the waste solution containing photoresist materials as dissolved, in which the dissolved photoresist materials in the waste solution is concentrated by an ultrafiltration of the specified characteristics, and further, the photoresist materials in the waste solution is cured or polymerized by exposing to radiation or heat energy, and the cured solid is yielded incorporating the polymerized materials and water. The inventive process provides the process of the management of the waste solution containing the photoresist materials comprising mainly the proceding step of ultrafiltration of the waste solution to separate a clean solution or permeate to be recycled to the process from the concentrated waste solution, and the succeeding step of forming a solidified materials by exposing the concentrated solution yielded in the preceding step to electomagnetic radiation and/or heat energy, which energy can be obtained from the burning of the resulting solidified materials, through effecting polymerization of waste photoresist materials in the concentrated waste solution.

REFERENCES:
patent: 4111803 (1978-09-01), Townend
patent: 4171265 (1979-10-01), Battigelli
patent: 4222874 (1980-09-01), Connelly
patent: 4294704 (1981-10-01), Daniel et al.
patent: 4595498 (1986-03-01), Cohen et al.
IBM Technical Disclosure Bulletin, vol. 25, No. 8, Jan. 1983, p. 4359, "Ultrafiltration for Waste Treatment," S. R. Blanks et al.
Chemical Abstracts, vol. 104, No. 18, May 5, 1986, p. 396, Abstract No. 155202g, U. Von Mylius et al.

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