Organic compounds -- part of the class 532-570 series – Organic compounds – Carboxylic acid esters
Reexamination Certificate
2007-04-24
2007-04-24
Zucker, Paul A. (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Carboxylic acid esters
Reexamination Certificate
active
11486116
ABSTRACT:
A novel monomethyl malonate derivative is represented by following Formula (I):wherein X is a halogen atom; and Me is methyl group. This compound can be prepared by the steps of (A) reacting a benzyl halide derivative represented by following Formula (II):wherein X and Y may be the same as or different from each other and are each a halogen atom, with dimethyl malonate in the presence of a base to yield a dimethyl malonate derivative represented by following Formula (III):wherein X and Me have the same meanings as defined above; and (B) hydrolyzing the dimethyl malonate derivative of Formula (III). The compound is useful in the production of an indanonecarboxylic acid ester having a halogen atom on the indanone ring.
REFERENCES:
patent: 4588746 (1986-05-01), Watthey
patent: 4824868 (1989-04-01), Watthey
patent: 5869657 (1999-02-01), Annis et al.
patent: 7026335 (2006-04-01), Ebetino et al.
patent: 5-25164 (1993-02-01), None
patent: WO-91/05763 (1991-05-01), None
patent: WO-95/29171 (1995-11-01), None
patent: WO-00/10963 (2000-03-01), None
J. Org. Chem., vol. 65, (2000), pp. 5834-5836.
J. Amer. Chem. Soc., vol. 74, (1952), pp. 5897-5899.
J. Med. Chem., vol. 13, (1970), pp. 820-826.
Synthesis, vol. 6, (1987), pp. 565-566.
Takuwa et al., Chemistry Letters, vol. 33, No. 1, (2004), pp. 8-9.
Bohme et al., J. Med. Chem., vol. 46, (2003), pp. 856-867.
Hamatani Takeshi
Nose Satoru
Sano Kieko
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