Maleimide-alt-silylstyrene copolymer

Details Maleimide-alt-silylstyrene copolymer Maleimide-alt-silylstyrene copolymer

1993-06-07

1994-05-31

Anderson, Harold D.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526279, 528322, C08F 2240

Patent

active

053170695

ABSTRACT:
The present invention discloses a maleimide-alt-trialkylsilylstyrene copolymer having the formula: ##STR1## wherein: R.sub.1 is H or methyl;

REFERENCES:
patent: 5182351 (1993-01-01), Shiobara et al.
S. Richard Turner et al., "High-Tg Base-Soluble Copolymers as Novolac Replacements for Positive Photoresists" Polymer Engineering and Science, MID-Sep. 1986, vol. 26, No. 16, 1096.
C. E. Osuch, et al., "A New Class of Resins for Deep Ultraviolet Photoresists" SPIE vol. 631 Advances in Resist Technology and Processing III (1986), 68.
R. Sezi, et al., "Silicon Containing Photoresists for Half Micron Lithography" Polymer Engineering and Science, Mid-Jul. 1989, vol. 29, No. 13, 891.
Wen-Yen Chiang et al., "Preparation and Properties of Si-Containing Copolymer for Near-UV Resist 1 Poly (N-(4-Hydroxyphenyl) maleimide-alt-p-Trimethylsilylstyrene)" 1991.
Wen-Yen Chiang et al., "Preparation and Properties of Silicon-Containing Copolymers for near-UV resists, II" Die Angewandte Makromolekulare chemie 205 (1993) 75-90 (No. 3532).
Gary N. Taylor et al., "The Role of Inorganic Material in Dry-Processed Resist Technology" Solid State Technology/Feb. 1984, 145.

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