Metal treatment – Compositions – Heat treating
Patent
1976-05-11
1977-12-20
Ozaki, G.
Metal treatment
Compositions
Heat treating
148171, 148177, 148187, 252 623GA, H01L 21208
Patent
active
040639657
ABSTRACT:
A process for forming aluminum doped silicon semiconductor material for large area semiconductor devices embodies thermal gradient zone melting processing and migration of a molten zone of a predetermined thickness to assure stability of the molten zone while migrating.
REFERENCES:
patent: 2813048 (1957-11-01), Pfann
patent: 3205101 (1965-09-01), Mlavsky et al.
patent: 3484302 (1969-12-01), Maeda et al.
patent: 3520735 (1970-07-01), Kurata
Anthony Thomas R.
Cline Harvey E.
Cohen Joseph T.
General Electric Company
Ozaki G.
Squillaro Jerome C.
Winegar Donald M.
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