Etching a substrate: processes – Nongaseous phase etching of substrate – Etching using radiation
Patent
1995-09-07
1998-12-15
Ludlow, Jan
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching using radiation
216 95, 216100, 422 58, 422 61, 422 99, 422102, 4352861, 4352871, 4352891, 4353031, 435 87, 435 88, H01L 21302
Patent
active
058492089
ABSTRACT:
Miniaturized, self-contained apparatus for conducting bio-chemical reactions and analyses is formed in a compact structure made from a substrate which includes a plurality of reaction chambers and a plurality of analysis chambers which are in fluid communication with the reaction chambers. Independently controllable heaters and coolers are positioned in thermal contact with the reaction chambers to permit parallel processing of biological samples at different temperature cycles. The apparatus is especially useful for performing and analyzing the results of a polymerase chain reaction.
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Frederickson Christopher J.
Hayes Donald J.
Wallace David B.
Ludlow Jan
MicroFab Technoologies, Inc.
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