Maintaining optical signals in prescribed alignment with respect

Details Maintaining optical signals in prescribed alignment with respect Maintaining optical signals in prescribed alignment with respect

1987-06-12

1988-11-15

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01N 2186, G01V 904

Patent

active

047851929

ABSTRACT:
A deep-UV step-and-repeat photolithography system includes a narrow-bandwidth pulsed excimer laser illumination source and an all-fused-silica lens assembly. The system is capable of line definition at the 0.5-micrometer level. One significant feature of the system is its ability to perform wafer focus tracking by simply changing the frequency of the laser.

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patent: 4577113 (1986-03-01), Marantette et al.
patent: 4592648 (1986-06-01), Tabarelli et al.
patent: 4617469 (1986-10-01), Takahashi et al.
patent: 4677301 (1987-06-01), Tanimoto et al.

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