Magnification measuring mark

Details Magnification measuring mark Magnification measuring mark

1997-06-23

1999-02-09

Kim, Robert

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356400, 250548, G01B 1100

Patent

active

058702016

ABSTRACT:
A magnification measuring mark for measuring magnification compensation and correction values of multilayer patterns to be formed for a semiconductor device. The magnification measuring mark includes an inner box and a pair of measuring patterns respectively arranged on the left and right of the inner box or above and below the inner box. The measuring patterns are adapted to measure a pattern misalignment in X and Y axes. One of the measuring patterns is set as a reference measuring pattern for measuring a magnification of the other pattern not set as the reference measuring pattern.

REFERENCES:
patent: 4664527 (1987-05-01), Hattori et al.
patent: 5414519 (1995-05-01), Han
patent: 5529595 (1996-06-01), Ueki et al.

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