Optical: systems and elements – Lens – With field curvature shaping
Patent
1996-08-02
1998-07-14
Nelms, David C.
Optical: systems and elements
Lens
With field curvature shaping
359650, 359651, 359364, 359683, 396430, G02B 300, G02B 1700, G02B 1514
Patent
active
057813469
ABSTRACT:
Magnification correction for small field scanning of large blanks is provided by adding magnification adjusting elements (lenses) to a double pass Wynne-Dyson lens or other type of one-to-one projection lens. The magnification adjusting optical elements includes two pairs of low power lenses, one associated with each of the input and output prisms of a Wynne-Dyson lens. Movement of the magnification adjusting optics provides positive or negative magnification as needed to correct for any expansion or compaction of the blank relative to the reticle (mask) and hence maintain alignment. Further magnification correction is provided by a small velocity relative movement between the reticle and the blank by means of a secondary stage in the scan direction. This corrects for any alignment error in the scan direction and may be used independently of the optical correction technique with any type of projection lens.
REFERENCES:
patent: 3909834 (1975-09-01), Sanada et al.
patent: 5557469 (1996-09-01), Markle et al.
patent: 5559629 (1996-09-01), Sheets et al.
Goodall, F., et al., "Excimer Lasers As Deep UV Sources for Photolithographic System", Microelectronic Engineering, 5:445-452 (1986).
Allen Paul C.
Voisin Ronald D.
Etec System, Inc.
Klivans Norman R.
Lester Evelyn A.
Millers David T.
Nelms David C.
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