Magnetron tuning using plasmas

Electric lamp and discharge devices: systems – Combined load device or load device temperature modifying... – Distributed parameter resonator-type magnetron

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331 90, H01J 2320, H01J 25587

Patent

active

060641541

ABSTRACT:
Improved magnetron oscillators that controllably form a plasma within each of its resonant cavities to rapidly change the resonant frequency of each cavity. The present invention also provides for frequency tuning methods for use with magnetron oscillators. The plasma is controllably formed in one or more subcells of each resonant cavity in a manner that alters the electromagnetic field within each cavity. Preferably, a magnetized collisional plasma is controlled to rapidly change the resonant frequency of each cavity. However, many types of plasmas may be used to implement the present invention. Controlling formation of the plasma within each cavity tunes the magnetron oscillator on a submillisecond time scale.

REFERENCES:
patent: 4282499 (1981-08-01), DeFonzo

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