Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1987-04-16
1989-05-02
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C23C 1400
Patent
active
048265845
ABSTRACT:
A magnetron sputtering cathode with a target plate of the material to be sputtered connected to a support body of non-magnetic material, having a chamber disposed between the support body and the target plate, with a coolant flowing through said chamber, said chamber being formed by a recess in said support body, with said recess being tightly covered by said target plate; and having a permanent magnet system disposed beneath the target plate, wherein the target plate (10) abuts the front side of a plate-shaped support body (13) and the likewise plate-shaped permanent magnet system (12) abuts the back side thereof, and the permanent magnet system (12) has a plurality of continuous, meshing magnetic pole tongues (17, 19) of opposing polarity and arranged in spaced relationship to each other, with said tongues being coupled together via a magnet bridge (20) and producing a magnetic field of meandering shape extending substantially solidly over the entire surface of the target plate.
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Marquis Steven P.
Niebling John F.
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