Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-01-11
2000-12-12
McDonald, Rodney
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429809, 20429814, 20429819, 2042982, 20429823, C23C 1434
Patent
active
061593508
ABSTRACT:
A magnetron sputtering apparatus for forming a thin metal film on one of the major surfaces of a light-transmitting disc-shaped substrate as a disc substrate for an optical disc as mutually intersecting magnetic fields are applied by a magnetic field application unit provided at back of a target. The apparatus includes a center mask tightly contacted with the outer peripheral portion of one major surface of the disc substrate on which the thin film is formed for masking the center portion of the substrate and an outer peripheral mask tightly contacted with the outer peripheral portion of the one major surface of the disc substrate on which the thin film is formed for masking the outer peripheral portion. The outer peripheral mask is separated from and independent of the center mask.
REFERENCES:
patent: 4469719 (1984-09-01), Martin
patent: 4886592 (1989-12-01), Anderle et al.
patent: 4943363 (1990-07-01), Zejda et al.
patent: 5112467 (1992-05-01), Zejda
patent: 5164063 (1992-11-01), Braeuer et al.
patent: 5174880 (1992-12-01), Bourez et al.
patent: 5254236 (1993-10-01), Kinokiri et al.
WPI Abstract Accession No. 86-179686/28 & JP 61113141 A (Toshiba).
Iwasaki Masaaki
Yoshimura Yoshinori
McDonald Rodney
Sony Disc Technology Inc.
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