Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1989-03-09
1990-10-23
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419212, C23C 1435
Patent
active
049649680
ABSTRACT:
A magnetron sputtering apparatus has a target disposed above an inner magnetic pole surrounded by an outer magnetic pole of opposite polarity and a gradient adjusting means mounted underneath the target and interposed between the inner and outer magnetic poles. The gradient adjusting means operates such that the gradient of the component of the leakage magnetic field vertical to the target is reduced over the middle portion of the target, between the inner and outer magnetic poles, and is increased at portions closer to the magnetic poles. The gradient adjusting means may be made of a soft magnetic material or a permanent magnet material, and the soft magnetic material may be used alone or in combination with the permanent magnet material. A second permanent magnet may be used in conjunction with the use of a permanent magnet as the gradient adjusting means. The magnetron sputtering apparatus prevents localized erosion of the target, thus making the area of erosion on the target more uniform, prolonging the life of the target, and providing for more even sputtered films.
REFERENCES:
patent: 4265729 (1981-05-01), Morrison, Jr.
patent: 4865708 (1989-09-01), Welty
patent: 4892633 (1990-01-01), Welty
Mitsubishi Kasei Corp.
Weisstuch Aaron
Yee Stephen F. K.
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