Magnetron sputtered boron films

Details Magnetron sputtered boron films Magnetron sputtered boron films

1994-11-04

1998-06-16

Speer, Timothy

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Physical dimension specified

428336, 428457, 428704, B32B 904

Patent

active

057667470

ABSTRACT:
A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.

REFERENCES:
patent: 3488152 (1970-01-01), Kuehl
patent: 3677799 (1972-07-01), Hou
patent: 4177474 (1979-12-01), Ovshinsky
patent: 4342734 (1982-08-01), Kumar
patent: 5183777 (1993-02-01), Doki
patent: 5203977 (1993-04-01), Makowiecke
patent: 5389445 (1995-02-01), Makowiecki
Labou, S., Applied Optics, 24, 576 (1985).
SPIE vol. 984, Manufacture, Structure and Performance of W/B.sub.4 C Multilayer X-Ray Mirrors, A.F. Jankowski et al., pp. 64-74, 1988.
J. Vac. Sci. Technol. A8(6), Magnetron Sputtered Boron Films and Ti/B Multilayer Structures, D.M. Makowiecki et al., pp. 3910-3913, Nov./Dec. 1990.
7th CIMTEC, Densification Studies of Refractory Materials Using Hot Isostatic Pressing (HIP) And Tantalum Containment, C. Hoenig et al., pp. 1337-1345, Jun. 1990.
UCRL-JC-106571, Magnetron Sputter Deposition of Boron And Boron Carbide, M. McKernan et al., Apr. 1991.

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