Magnetron sputter etching system

Details Magnetron sputter etching system Magnetron sputter etching system

1985-03-13

1985-11-12

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

045526397

ABSTRACT:
A planar magnetron etching device having a movable magnetic source which is moved with respect to a substrate to cause lines magnetic flux parallel to the surface of the substrate to sweep above the surface of the substrate during the etching process.

REFERENCES:
patent: 4025410 (1977-05-01), Stewart
patent: 4162954 (1979-07-01), Morrison
patent: 4239611 (1980-12-01), Morrison
patent: 4243505 (1981-01-01), Penfold
patent: 4265729 (1981-05-01), Morrison
patent: 4444643 (1984-04-01), Garrett
Okano et al., Solid State Technol., Apr. 1982, pp. 166-170.

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