Magnetron sputter device using the same pole piece for coupling

Details Magnetron sputter device using the same pole piece for coupling Magnetron sputter device using the same pole piece for coupling

1984-05-17

1986-02-11

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, 204192M, C23C 1500

Patent

active

045697469

ABSTRACT:
A magnetron sputter device includes separate first and second targets over which first and second discharges are formed by separate ionizing electric fields and separate confining magnetic fields. The separate confining magnetic fields include first and second magnetic circuits through the first and second targets, respectively. The first magnetic circuit includes first and second pole pieces for coupling magnetic flux from a first magnetic field source to the first target. The second magnetic circuit includes the second pole piece and a third pole piece for coupling magnetic flux from a second magnetic field source to the second target. The magnetic circuits and the magnetic field sources are arranged so that magnetic fluxes from the first and second magnetic field sources combine in the second pole piece.

REFERENCES:
patent: 4265729 (1981-05-01), Morrison
patent: 4362611 (1982-12-01), Logan et al.
patent: 4389299 (1983-06-01), Adachi et al.
patent: 4392939 (1983-07-01), Crombeen et al.
patent: 4401539 (1983-08-01), Abe et al.
patent: 4407713 (1983-10-01), Zega
patent: 4415427 (1983-11-01), Hidler et al.
patent: 4422916 (1983-12-01), McKelvey
patent: 4431505 (1984-02-01), Morrison
patent: 4434038 (1984-02-01), Morrison
patent: 4441974 (1984-04-01), Nishikawa
patent: 4461688 (1984-07-01), Morrison

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