Magnetron sputter device having planar and curved targets

Details Magnetron sputter device having planar and curved targets Magnetron sputter device having planar and curved targets

1985-12-16

1986-08-19

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

046068066

ABSTRACT:
A magnetron sputter device includes a first target having an emitting surface and a second target having a concave emitting target defined by a side wall of a frustum of cone. Separate plasma discharges for the targets are confined by separate electromagnet derived magnetic fields, coupled to the targets by pole pieces.

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