Magnetron plasma reactor

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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Details

118728, 118 501, 118620, 156643, 156646, 156656, 204298, 20419232, C23F 102, B44C 122, C03C 1500, H01L 21306

Patent

active

046234179

ABSTRACT:
A magnetron plasma reactor wherein the susceptor is an aluminum arm extending into approximately the middle of a solenoidal magnetic field generated by a dc current.

REFERENCES:
patent: 4422896 (1983-12-01), Class et al.
patent: 4483737 (1984-11-01), Mantei
patent: 4572759 (1986-02-01), Benzing
patent: 4581118 (1986-04-01), Class et al.

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