Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1989-06-26
1990-10-02
Weisstuch, Aaron
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
20429806, 20429809, 20429819, 20429821, 20429824, 20429825, 20429826, 20429816, 505731, C23C 1434, C23C 1456, H01L 3924
Patent
active
049607537
ABSTRACT:
Apparatus for depositing and tailoring anisotropic properties of ceramic oxide-superconductor films onto the outer surface of fibers, wires, rods, and bars and onto the inner surface of tubes, as well as onto the surface of disc-shaped substrates, employs first and second vacuum chambers, a cylindrical magnetron structure positioned within the first vacuum chamber, a disc-shaped cold cathode positioned within the first vacuum chamber for providing a beam of energetic electrons for injection into a plasma region of the cylindrical magnetron structure, and a ring-shaped cold cathode positioned within the second vacuum chamber for providing a disc-shaped beam of electrons impinging upon the deposited film for annealing it. The magnetron cathodes comprise either single metal elements or mixtures thereof. A planar magnetron and a line-shaped cold cathode that produces an electron beam impinging on the surface of a planar substrate to provide a uniform strip heat zone are employed for depositing superconducting thin films of metal oxide ceramic materials onto the surface of wide area planar substrates.
REFERENCES:
patent: 3361659 (1968-01-01), Bertelsen
patent: 3988232 (1976-10-01), Wasa et al.
patent: 4863576 (1989-09-01), Collins et al.
Collins George J.
McNeil John R.
Yu Zeng-gi
Hein William E.
Weisstuch Aaron
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