Magnetron cathode sputtering apparatus

Details Magnetron cathode sputtering apparatus Magnetron cathode sputtering apparatus

1983-10-11

1984-08-21

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, 204192C, C23C 1500

Patent

active

044668775

ABSTRACT:
A magnetron cathode sputtering apparatus including a pair of rotary cylindrical sputtering targets mounted in spaced parallel relation in an evacuable coating chamber and separate magnetic means located within said targets, the magnetic means being oriented relative to one another such that the material sputtered therefrom will be directed inwardly and downwardly at an acute angle whereby the sputtered material from the two targets will be focused upon the substrates.

REFERENCES:
patent: 3901784 (1975-08-01), Quinn et al.
patent: 4356073 (1982-10-01), McKelvey
patent: 4417968 (1983-11-01), McKelvey

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