Magnetron cathode sputtering apparatus

Details Magnetron cathode sputtering apparatus Magnetron cathode sputtering apparatus

1981-02-12

1982-10-26

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

043560733

ABSTRACT:
A rotatable magnetron cathode sputtering apparatus for operation within an evacuable chamber for coating substrates that are also contained within said chamber. The cathode comprises an elongated cylindrical tube having a layer of the coating material or materials to be sputtered applied to the outer surface thereof. Magnetic means is mounted within the tube and includes at least one row of permanent U-shaped magnets extending lengthwise of the tube. The tube is horizontally disposed and rotatably mounted in the coating chamber such that it can be turned on its longitudinal axis relative to the magnets to selectively bring different portions or segments of the same sputtering material or different sputtering materials into sputtering position with respect to the magnets and within the magnetic field. Means is also provided for internally cooling the cathode.

REFERENCES:
patent: 4221652 (1980-09-01), Kuriyama
patent: 4290877 (1981-09-01), Buckensderfer
W. W. Anderson et al., "Magnetron Reactive Sputtering Deposition of Cu.sub.2 S/CdS Solar Cells", Proceedings, 2nd European Community Solar Energy Conf. (1979), pp. 890-897.

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