Magnetron cathode sputtering apparatus

Details Magnetron cathode sputtering apparatus Magnetron cathode sputtering apparatus

1982-02-11

1983-12-27

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

044229160

ABSTRACT:
A rotatable magnetron cathode sputtering apparatus for operation in an evacuable chamber for sputter coating substantially planar substrates as they move through said chamber. The cathode comprises an elongated, cylindrical tubular member having a layer of the coating material to be sputtered applied to the outer surface thereof. Magnetic means are mounted within the tubular member and includes at least one row of permanent magnets extending lengthwise thereof. The tubular member is horizontally mounted in the coating chamber for rotation about its longitudinal axis either in a step-by-step fashion or continuously, relative to the magnets to bring different portions of the coating material into sputtering position opposite said magnets and within the sputter coating zone.

REFERENCES:
patent: 4356073 (1982-10-01), McKelvey

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