Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1982-02-16
1983-07-19
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204298, C23C 1500
Patent
active
043942369
ABSTRACT:
A magnetron cathode sputtering apparatus for operation within an evacuable chamber for coating planar substrates, such as glass sheets, that are also contained in said chamber. The cathode comprises an elongated substantially U-shaped support member mounted in said chamber and provided with a concavo-convex bottom wall. Magnetic means is mounted within the support member and includes an array of permanent magnets extending lengthwise thereof to provide a magnetic field which establishes the zone or region in which sputtering of the target material takes place. The target comprises a replaceable continuous band or foil of the material to be sputtered. The foil is mounted on a feed roll at one side of the cathode and is advanced across said support member in contact with the convex surface of the bottom wall thereof for sputtering as it passes through the sputter zone, and subsequently wound onto a take-up roll at the opposite side of said cathode. Planar substrates, transported relative to the target foil, are sputter coated as they pass through the sputter zone.
REFERENCES:
patent: 3898952 (1975-08-01), Shirahata et al.
patent: 4356073 (1982-10-01), McKelvey
Nobbe William E.
Shatterproof Glass Corporation
Weisstuch Aaron
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