Magnetron cathode sputtering apparatus

Details Magnetron cathode sputtering apparatus Magnetron cathode sputtering apparatus

1982-02-16

1983-07-19

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

043942369

ABSTRACT:
A magnetron cathode sputtering apparatus for operation within an evacuable chamber for coating planar substrates, such as glass sheets, that are also contained in said chamber. The cathode comprises an elongated substantially U-shaped support member mounted in said chamber and provided with a concavo-convex bottom wall. Magnetic means is mounted within the support member and includes an array of permanent magnets extending lengthwise thereof to provide a magnetic field which establishes the zone or region in which sputtering of the target material takes place. The target comprises a replaceable continuous band or foil of the material to be sputtered. The foil is mounted on a feed roll at one side of the cathode and is advanced across said support member in contact with the convex surface of the bottom wall thereof for sputtering as it passes through the sputter zone, and subsequently wound onto a take-up roll at the opposite side of said cathode. Planar substrates, transported relative to the target foil, are sputter coated as they pass through the sputter zone.

REFERENCES:
patent: 3898952 (1975-08-01), Shirahata et al.
patent: 4356073 (1982-10-01), McKelvey

Affiliated with

Also associated with

Rating

Magnetron cathode sputtering apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetron cathode sputtering apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetron cathode sputtering apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-750186