Magnetron cathode for sputtering ferromagnetic targets

Details Magnetron cathode for sputtering ferromagnetic targets Magnetron cathode for sputtering ferromagnetic targets

1984-12-05

1986-07-22

Tufariello, T. M.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1500

Patent

active

046018069

ABSTRACT:
A magnetron cathode for sputtering targets of ferromagnetic materials. A cathode ground body (2) has at least one supporting surface (4a, 4c) for the target and a magnet system (6) with magnet poles of opposite polarity cohering on the circumference, lying inside one another, and separated by a gap (5a). The target is divided by at least one air gap geometrically similar to the shape of the interval into at least two target parts (12, 13) which are staggered in the direction of the depth of the cathode on the at least one supporting surface (4a, 4c). In accordance with the invention,

REFERENCES:
patent: 4198283 (1980-04-01), Class
patent: 4299678 (1981-11-01), Meckel
patent: 4431505 (1984-02-01), Morrison, Jr.

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