Magnetron cathode for a rotating target

Details Magnetron cathode for a rotating target Magnetron cathode for a rotating target

1992-11-13

1994-11-15

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20429821, C23C 1434

Patent

active

053645189

ABSTRACT:
Magnets are arranged inside a rotating tubular target to form a racetrack-shaped plasma having two straight stretches parallel to the target axis and two end stretches connecting the straight stretches. In order to achieve uniform target erosion, the magnets are arranged so that the plasma is wider and therefore less intense over the end stretches than it is over the straight stretches.

REFERENCES:
patent: 4221652 (1980-09-01), Kuriyama
patent: 4892633 (1990-01-01), Welty
patent: 4943361 (1990-07-01), Kakehi et al.
patent: 5047131 (1991-09-01), Wolfe et al.
patent: 5069772 (1991-12-01), Fritsche et al.
patent: 5174880 (1992-12-01), Bourez et al.
Wright et al., "Design . . . Magnetron", J. Vac. Sci. Technol. A 4(3), May/Jun. 1986, pp. 388-392.

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