Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-04-03
1996-07-30
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429811, 20429812, 20419212, C23C 1434
Patent
active
055408230
ABSTRACT:
A magnetron cathode for a cathode sputtering system has a target holder for holding a target 9 where the erosion zone is opposite the substrate. The non-sputtering target surfaces 9a are covered with a barrier layer or protective layer 21.
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Leybold Aktiengesellschaft
Nguyen Nam
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