Magnetron cathode

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

20429811, 20429812, 20419212, C23C 1434

Patent

active

055408230

ABSTRACT:
A magnetron cathode for a cathode sputtering system has a target holder for holding a target 9 where the erosion zone is opposite the substrate. The non-sputtering target surfaces 9a are covered with a barrier layer or protective layer 21.

REFERENCES:
patent: 4169031 (1979-09-01), Brors
patent: 4200510 (1980-04-01), O'Connell et al.
patent: 4407707 (1983-10-01), Landau
patent: 4434042 (1984-02-01), Keith
patent: 4448653 (1984-05-01), Wegmann
patent: 4486287 (1984-12-01), Fournier
patent: 4500409 (1985-02-01), Boys et al.
patent: 4515675 (1985-05-01), Kieser et al.
patent: 4747927 (1988-05-01), Rille et al.
patent: 4933064 (1990-06-01), Geisler et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Magnetron cathode does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetron cathode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetron cathode will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1655907

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.