Magnetron

Details Magnetron Magnetron

1997-07-22

1999-11-30

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723E, 20429837, H05H 100

Patent

active

059935987

ABSTRACT:
Methods and devices for producing plasmas of more uniform density and greater height than plasmas generated by previously known magnetron-type plasma-generating devices. The present invention utilizes electrodes containing multiple magnets positioned such that like magnetic poles of the magnets are all facing in substantially the same direction.

REFERENCES:
patent: 2146025 (1939-02-01), Penning
patent: 4013532 (1977-03-01), Cormia et al.
patent: 4260647 (1981-04-01), Wang et al.
patent: 4496450 (1985-01-01), Hitotsuyanagi et al.
patent: 4863756 (1989-09-01), Hatig et al.
patent: 4886565 (1989-12-01), Koshiba et al.
patent: 5160398 (1992-11-01), Yanagida
patent: 5178743 (1993-01-01), Kumar
patent: 5298587 (1994-03-01), Hu et al.
patent: 5320875 (1994-06-01), Hu et al.
patent: 5364666 (1994-11-01), Williams et al.
patent: 5433786 (1995-07-01), Hu et al.
patent: 5494712 (1996-02-01), Hu et al.
patent: 5627435 (1997-05-01), Jansen et al.
Plasma Deposition, Treatment and Etching of Polymers, "Plasma Polymer-Metal Composite Films", H. Biedeman and L. Martinu, pp. 269-320.
Handbook of Plasma Processing Technology, "Magnetron Plasma Deposition Processes", S. M. Rossnagel, pp. 160-162.
Solid State Technology/Apr. 1987, "Magnetically enhanced Plasma Deposition and Etching", Michael F. Leahy & Grzegoriz Kanganowicz, pp. 99-105.
The First Annual International Conference of Plasma Chemistry and Technology, "Plasma Polymerization: The Effect of Frequency and of the Planar Magnetron Geometry", N. Morosoff, pp. 41-53.
Thin Solid Films 1993, "Plasma Polymerization of Tetramethydisiloxane by a Magnetron Glow Discharge", pp. 171-184.
J. Vac. Sci. Technol (1978), "Plasma Polymerization of Ethylene by Magnetro Discharge", pp. 1815-1822.

Affiliated with

Also associated with

Rating

Magnetron does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetron, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetron will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1666876