Magnetron

Details Magnetron Magnetron

1999-01-08

2000-05-02

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723MA, 118723R, 156345, 31511141, 427489, 427 58, 427127, 4272553, 4272556, 427471, 427474, 427547, 427578, 427598, C23C 1600

Patent

active

060559292

ABSTRACT:
Methods and devices for producing plasmas of more uniform density and greater height than plasmas generated by previously known magnetron-type plasma-generating devices. The present invention utilizes electrodes containing multiple magnets positioned such that like magnetic poles of the magnets are all facing in substantially the same direction.

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