Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Reexamination Certificate
2007-01-30
2007-01-30
Baumeister, B. William (Department: 2891)
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
C257SE21665
Reexamination Certificate
active
10912979
ABSTRACT:
Fabricating a magnetoresistive random access memory cell and a structure for a magnetoresistive random access memory cell begins by providing a substrate having a transistor formed therein. A contact element is formed electrically coupled to the transistor and a dielectric material is deposited within an area partially bounded by the contact element. A digit line is formed within the dielectric material, the digit line overlying a portion of the contact element. A conductive layer is formed overlying the digit line and in electrical communication with the contact element.
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Butcher Brian R.
Durlam Mark A.
Grynkewich Gregory W.
Tracy Clarence J.
Anya Igwe U.
Baumeister B. William
Freescale Semiconductor Inc.
Ingrassia Fisher & Lorenz
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