Magnetoresistive random access memory devices and methods...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE21665

Reexamination Certificate

active

10912979

ABSTRACT:
Fabricating a magnetoresistive random access memory cell and a structure for a magnetoresistive random access memory cell begins by providing a substrate having a transistor formed therein. A contact element is formed electrically coupled to the transistor and a dielectric material is deposited within an area partially bounded by the contact element. A digit line is formed within the dielectric material, the digit line overlying a portion of the contact element. A conductive layer is formed overlying the digit line and in electrical communication with the contact element.

REFERENCES:
patent: 6365419 (2002-04-01), Durlam et al.
patent: 6430084 (2002-08-01), Rizzo et al.
patent: 6501144 (2002-12-01), Rizzo
patent: 6555858 (2003-04-01), Jones et al.
patent: 6943038 (2005-09-01), Meixner et al.
patent: 2004/0087163 (2004-05-01), Steimle et al.
patent: 2004/0175848 (2004-09-01), Chen et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Magnetoresistive random access memory devices and methods... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetoresistive random access memory devices and methods..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetoresistive random access memory devices and methods... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3736545

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.