Magnetoresistive memory device and method for fabricating...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S421000

Reexamination Certificate

active

06998276

ABSTRACT:
Embodiments of the invention include magnetoresistive memory cells having magnetic focusing spacers are formed on sidewalls thereof. Therefore, magnetic fields generated by a bit line and a digit line are focused by the magnetic focusing spacers and efficiently transferred to the magnetoresistive memory cell. In addition, an interlayer dielectric layer surrounding the magnetoresistive memory cell may be formed of high permeability material, thereby efficiently transferring magnetic field.

REFERENCES:
patent: 5569617 (1996-10-01), Yeh et al.
patent: 5902690 (1999-05-01), Tracy et al.
patent: 6473328 (2002-10-01), Mercaldi
patent: 6504197 (2003-01-01), Minakata et al.
patent: 6555858 (2003-04-01), Jones et al.
patent: 6627913 (2003-09-01), Chen
patent: 6783995 (2004-08-01), Hineman et al.
patent: 6927467 (2005-08-01), Kim
patent: 2004/0061166 (2004-04-01), Kim
patent: 11-238377 (1999-08-01), None
patent: 2001-0100862 (2001-11-01), None
English language abstract of the Japanese Publication No. 11-238377, Aug. 1999.
English language abstract of the Korean Publication No. 2001-0100862, Nov. 2001.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Magnetoresistive memory device and method for fabricating... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetoresistive memory device and method for fabricating..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetoresistive memory device and method for fabricating... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3703604

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.