Magnetoresistive effect thin-film magnetic head and...

Details Magnetoresistive effect thin-film magnetic head and... Magnetoresistive effect thin-film magnetic head and...

2006-11-28

2006-11-28

Vinh, Lan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S706000, C438S714000, C216S072000, C216S077000

Reexamination Certificate

active

07141508

ABSTRACT:
A manufacturing method of an MR thin-film magnetic head with an MR film and lead conductors overlapping each other, includes a step of depositing a conductor layer on at least the magnetoresistive effect film, a step of forming a cap layer patterned on the deposited conductor layer, and a step of dry-etching the deposited conductor layer through a mask of the patterned cap layer using an Ar gas and an O2gas, an O2gas or a N2gas so as to pattern the deposited conductor film to form the lead conductors.

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