Magnetoresistance effect element

Electrical resistors – Resistance value responsive to a condition – Magnetic field or compass

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

324252, H01L 4300

Patent

active

053652126

ABSTRACT:
A magnetoresistance effect element includes a multilayer in which magnetic layers, mixture layers each constituted by a mixture of a ferromagnetic element and a non-ferromagnetic element, and nonmagnetic layers are stacked on each other so as to exhibit a magnetoresistance effect. In this element, each of the mixture layers is interposed between the magnetic layer and the nonmagnetic layer, and 2 (X.sub.1 /X.sub.n)
is larger than 1.1 where n is the number of atomic layers of the mixture layer, X.sub.1 is the atomic concentration (%) of the ferromagnetic element of an atomic layer closest to the magnetic layer, and X.sub.n is the atomic concentration (%) of the ferromagnetic element of an n-th atomic layer closest to the nonmagnetic layer.

REFERENCES:
patent: 4949039 (1990-08-01), Grunberg
patent: 5168760 (1992-12-01), Wun-Fogle et al.
patent: 5206590 (1993-04-01), Dieny et al.
patent: 5243316 (1993-09-01), Sakakima et al.
Physical Review B, vol. 43, No. 16, Jun. 1, 1991, The American Physical Society, pp. 13 228-13 231, K. Le Dang, et al., "NMR and Magnetization Studies of Co/Cu Superlattices".
Physical Review B, vol. 44, No. 16, Oct. 15, 1991, The American Physical Society, pp. 9100-9103, H. A. M. Gronckel, et al., "Nanostructure of Co/Cu Multilayers".

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Magnetoresistance effect element does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetoresistance effect element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetoresistance effect element will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1100476

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.