Etching a substrate: processes – Forming or treating article containing magnetically...
Patent
1998-07-16
1999-08-17
Bueker, Richard
Etching a substrate: processes
Forming or treating article containing magnetically...
216 67, 216 79, G11B 500
Patent
active
059389419
ABSTRACT:
An inductive head structure provided in a magnetoresistance effect composite head includes an inductive head and a magnetoresistance effect head, the inductive head structure including a magnetic gap layer sandwiched by first and second magnetic layers acting as magnetic poles, the first magnetic layer being positioned close to the magnetoresistance effect head, the magnetic gap layer being made of a non-magnetic and electrically insulative material, wherein the non-magnetic and electrically insulative material has a higher etching rate to reactive ion etching than at least a magnetic material of the second magnetic layer.
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Ishi Tsutomu
Ishiwata Nobuyuki
Kumagai Kazumasa
Nagahara Kiyokazu
Bueker Richard
NEC Corporation
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