Chemistry: analytical and immunological testing – Measurement of electrical or magnetic property or thermal... – By means of a solid body in contact with a fluid
Patent
1997-02-12
1998-10-13
Ludlow, Jan
Chemistry: analytical and immunological testing
Measurement of electrical or magnetic property or thermal...
By means of a solid body in contact with a fluid
324204, 324219, 324229, 324230, 422 57, 422 681, 422 83, 436149, 436150, 73DIG2, G01N 2774
Patent
active
058211292
ABSTRACT:
A magnetochemical sensor for continuous and in-situ sensing of a given chemical species/stimuli includes two magnetically-soft magnetic film layers and a chemical transduction layer that shrinks or swells in the presence of that given chemical species/stimuli. The magnetic switching characteristics of the sensor are dependent upon the thickness of the chemical transduction layer. A method for remotely interrogating the magnetic switching characteristics of the sensor is also provided. In the method, magnetic flux detecting coils are utilized to monitor the sensor.
REFERENCES:
patent: 3744296 (1973-07-01), Beltzer
patent: 4069714 (1978-01-01), Spewock et al.
patent: 4173975 (1979-11-01), DeLong et al.
patent: 4812758 (1989-03-01), Yamashita et al.
patent: 4841244 (1989-06-01), Chambers
patent: 5008620 (1991-04-01), Nonaka et al.
patent: 5348761 (1994-09-01), Mitter et al.
patent: 5355714 (1994-10-01), Suzuki et al.
patent: 5403700 (1995-04-01), Heller et al.
patent: 5502381 (1996-03-01), Saitou
patent: 5510172 (1996-04-01), Araki et al.
patent: 5514337 (1996-05-01), Groger et al.
Grimes Craig A.
Seitz William R.
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