Magnetion sputtering of ferromagnetic material

Details Magnetion sputtering of ferromagnetic material Magnetion sputtering of ferromagnetic material

1977-07-25

1978-06-13

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

75170, C23C 1500

Patent

active

040947610

ABSTRACT:
A method for the magnetron sputtering of ferromagnetic material. An alloy of the ferromagnetic material is formed such that the alloy retains the desired characteristics of the material but the alloy has a Curie temperature that is below the sputtering temperature. In particular, the method can be applied to nickel by alloying the nickel with copper, platinum, or tin.

REFERENCES:
patent: 4060470 (1977-11-01), Clarke
J. A. Thornton, et al. "Internal Stresses In Ti, Ni, Mo, and Ta Films Deposited by Cylindrical Magnetron Sputtering," J. Vac. Sci. Tech., vol. 14, pp. 164-168 (1977).
A. Aronson, et al. "Inline Production Magnetron Sputtering", Vacuum, vol. 27, pp. 151-153 (1977).
P. A. Albert, et al., "Influence of Biased Magnetron Deposition Parameters on Amorphous Gd-Co-Cu Properties," J. Vac. Sci. Tech., vol. 14, pp. 138-140 (1977).

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