Magnetic tunnel junction cap structure and method for...

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Magnetic field

Reexamination Certificate

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C257SE29323, C438S003000

Reexamination Certificate

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07112861

ABSTRACT:
A a magnetic random access memory (MRAM) device includes a cap layer formed over a magnetic tunnel junction (MTJ) stack layer, an etch stop layer formed over the first cap layer, and a hardmask layer formed over the etch stop layer. The etch stop layer is selected from a material such that an etch chemistry used for removing the hardmask layer has selectivity against etching the etch stop layer material.

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patent: 2003/0076703 (2003-04-01), Kim et al.
patent: 2003/0181056 (2003-09-01), Kumar et al.
patent: 2003/0199104 (2003-10-01), Leuschner et al.
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patent: 2003/0207486 (2003-11-01), Deak
patent: 2005/0102720 (2005-05-01), Lee
patent: 2005/0191764 (2005-09-01), Yates et al.

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