Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1982-11-05
1983-11-08
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204192R, 204298, C23C 1500
Patent
active
044140860
ABSTRACT:
Magnetron sputter coating sources are usually designed for vacuum deposition of nonmagnetic materials. Such sources employ nonmagnetic sputter targets. In some cases it is desired to use the same magnetron sources to dispense magnetic materials. It is therefore desired to use magnetic sputter targets interchangeably with nonmagnetic sputter targets. The novel design approach of the present invention employs a magnetic sputter target comprising first and second magnetic target portions separated by a gap. These magnetic target portions serve as virtual pole pieces. The fringing magnetic field adjacent the gap serves to position and enhance the glow discharge. By controlling the configurations of these virtual pole pieces and the gap between them, the glow discharge and the corresponding target erosion pattern may, within limits, be shaped as desired. The magnetic target portions need not be magnetically saturated. Hence they may be made relatively thick in cross-section, thereby providing relatively large reservoirs of magnetic sputter target material.
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B. I. Bertelsen, "Sputtering Cathode for Magnetic Film Deposition," IBM Technical Disclosure Bulletin, vol. 6, No. 2, Jul. 1963, pp. 69, 70.
B. I. Bertelsen, "Long-Life Sputtering Cathode for Magnetic Film Deposition", IBM Technical Bulletin, vol. 11, No. 2, Jul. 1968, p. 147.
Cole Stanley Z.
Demers Arthur P.
Herbert Leon F.
Varian Associates Inc.
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