Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Reexamination Certificate
2007-11-15
2011-10-04
Bernatz, Kevin M. (Department: 1785)
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
C430S030000, C430S320000, C428S848100
Reexamination Certificate
active
08029952
ABSTRACT:
There is provided a method for fabricating a magnetic recording medium that provides high throughput, low manufacturing cost, and no degradation in accuracy in pattern size in fine pattern formation. A resist layer is formed on a substrate or cutting work layer. The surface of the substrate is divided into two or more areas using the center of rotation of the substrate as a reference point. An optical, contactless pattern transfer method is used to transfer a figure pattern contained in the divided area through a mask to the resist layer so as to form a latent image of the figure pattern. The pattern transfer is similarly carried out for the divided area. After the pattern transfer processes for all the divided areas are completed, the entire resist layer is developed to form a resist pattern. The resist pattern is used as a mask to cut the substrate or cutting work layer. As a result, there is provided the substrate or cut work layer onto which a fine pattern has been transferred.
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Office Action from Japanese Patent Office in the corresponding Japanese Application No. 2007-042546, mailed Mar. 30, 2010 in Japanese.
Haginoya Chiseki
Tsuchiya Yuko
A. Marquez, Esq. Juan Carlos
Bernatz Kevin M.
Falasco Louis
Hitachi , Ltd.
Stites & Harbison PLLC
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