Magnetic recording medium and method for manufacturing the same

Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation

Reexamination Certificate

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C427S525000, C427S530000, C427S131000, C427S533000, C427S577000, C204S192150, C204S192380

Reexamination Certificate

active

07045175

ABSTRACT:
A method for manufacturing a magnetic recording medium includes forming a first protective layer of first material over a magnetic film provided on a substrate. The first protective layer has a thickness of about 0.2 nm to about 2 nm. A second protective layer of second material is formed over the first protective layer by driving ions of the second material into the first protective layer. The first protective layer is configured to prevent the ions of the second material from penetrating into the magnetic film.

REFERENCES:
patent: 4664976 (1987-05-01), Kimura et al.
patent: 5763087 (1998-06-01), Falabella
patent: 5858477 (1999-01-01), Veerasamy et al.
patent: 6524687 (2003-02-01), Horng et al.
patent: 6576328 (2003-06-01), Deng et al.
patent: 6638608 (2003-10-01), Gui et al.
patent: 6689425 (2004-02-01), Ma et al.
patent: 2001-063717 (2001-03-01), None
patent: 2002-32907 (2002-01-01), None
A.C. Ferrari, et al., “Density, sp3Fraction and Cross-Sectional Structure of Amorphous Carbon Films Determined by X-Ray Reflectivity and Electron Energy-Loss Spectroscopy,”American Physical Society(2000) vol. 62, No. 16:11089-11103.
Xu, Shi, et al., “Properties of Carbon Ion Deposited Tetrahedral Amorphous Carbon Films as a Function of Ion Energy,”J. Appl. Phys. (1996) vol. 79, No. 9:7234-7240.
Robertson, J., “Ultrathin Carbon Overcoats for Magnetic Storage Technology”TRIB(1999) vol. 9:39-45.
ChapmanGlow Discharge Processes: Sputtering and Plasma Etching, chapter 3, pp. 51-65, Wiley-Interscience publisher (Sep. 1980).
Shi et al. “The Double Bend Filtered Cathodic Arc Technology and Its Tribology Applications,” Journal of Japanese Society of Tribologists 45:27-32 (2000).
Yamashina et al.Fundamentals and Application of Surface Analysis, pp. 56-64, Tokyo University Press publisher (1991).
Yushkov et al. “Ion Velocities in Vacuum Arc Plasmas,” Journal of Applied Physics 88:5618-5622 (2000).

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