Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1995-10-12
1997-11-25
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427131, 427132, 427250, 4272553, 4272557, 4273982, 427526, 427585, C23C 1414
Patent
active
056910088
ABSTRACT:
A magnetic recording medium fabrication device includes a cooling drum around which a substrate runs while being cooled thereby, an ion gun arranged upstream to a vapor deposition station for kicking out particles absorbed on the plane of the substrate, a cooling body arranged between the cooling drum and ion gun for absorbing kicked out particles and a vapor deposition means for depositing a magnetic layer on the substrate at the vapor deposition station. The magnetic particles forming the magnetic layer that have residual magnetization vectors within .+-.10.degree. of the easy axis direction including the magnetic anisotropy of the medium are greater than or equal to 70% and less than or equal to 90% of the total amount of magnetic particles.
REFERENCES:
patent: 5202149 (1993-04-01), Ishida et al.
patent: 5418059 (1995-05-01), Sugita et al.
patent: 5451427 (1995-09-01), Takahashi et al.
patent: 5458914 (1995-10-01), Tohma et al.
Ishida Tatsuaki
Sugita Ryuji
Thoma Kiyokazu
Yoshimoto Kazunari
Matsushita Electric - Industrial Co., Ltd.
Pianalto Bernard
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