Magnetic material

Details Magnetic material Magnetic material

1994-08-12

1996-08-27

Sheehan, John

Metal treatment

Stock

Magnetic

148315, 420 83, 420117, 420125, 252 6254, H01F 1055

Patent

active

055497667

ABSTRACT:
A permanent magnet is composed of a magnetic material which is represented by a general formula R1.sub.x R2.sub.y A.sub.z Co.sub.u Fe.sub.100-x-y-z-u (where R1 is at least one element selected from rare earth elements, R2 is at least one element selected from the group consisting of Sc, Zr and Hf, A is at least one element selected from the group of C, N and P, and x,y,z and u are atomic percent defined as 2.ltoreq.x, 4.ltoreq.x+y.ltoreq.20, 0.ltoreq.z.ltoreq.20, 0.ltoreq.u.ltoreq.70), wherein the material includes a principal phase of TbCu.sub.7 structure and .alpha.-Fe, a peak width at half height of the main peak of X-ray diffraction of the principal phase obtained by using Cu-K.alpha. X-rays with the resolution of 0.02.degree. or less is about 0.8.degree. or less, and a ratio of peak intensity between the principal phase and .alpha.-Fe satisfies a relation that the value of I.sub.Fe /(I.sub.p +I.sub.Fe) is about 0.4 or less where I.sub.p is the peak intensity of main peak of X-ray diffraction of the principal phase obtained by using Cu-K.alpha. X-rays and I.sub.Fe is that of .alpha.-Fe.

REFERENCES:
Fuki et al., "Effect of Zirconeum upon Structure and Magnetic Properties of 2-17 Type Rare-Earth Cobalt Magnets"IEEE Tran on May. MAG 23 Sep. (87) No. 5 pp. 2705-2707.
Patent Abstracts of Japan, vol. 13, No. 293 (C-615) (3641), Jul. 6, 1989 and JP-A-1-87-645 Mar. 31, 1989.
Patent Abstracts of Japan, vol. 13, No. 58 (E-714) (3406) Feb. 9, 1989.

Affiliated with

Also associated with

Rating

Magnetic material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetic material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetic material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1053888